does the ALD deposition process of ReS2 generate crystals or thin film, briefly enlighten on how to get either of them

The Atomic Layer Deposition (ALD) process for ReS₂ (Rhenium disulfide) primarily produces thin films rather than single crystals. This technique is widely employed in the field of materials science for its ability to control film thickness on the atomic scale, making it ideal for creating uniform coatings and thin films in semiconductor applications.

ALD Deposited Thin Films vs. Crystals

Thin Films

Thin films of ReS₂ created through ALD have numerous advantages, especially in electronics, optics, and materials engineering. These films are typically uniform and can be deposited on various substrates with precise thickness control, leading to superior performance in devices such as field-effect transistors and photodetectors.

Key Features of ALD Thin Films:

• Uniformity: ALD allows for uniform coverage over complex geometries thanks to its layer-by-layer deposition method.
• Thickness Control: By adjusting the number of ALD cycles, you can achieve precise control over the thickness of ReS₂ films, often down to a few nanometers.
• Quality: The thin films produced are generally of high quality with fewer defects, which is crucial for device performance.

Crystalline Form

While ALD is primarily used for thin films, options are available to create crystalline structures if needed. However, achieving high-quality crystal growth of ReS₂ typically requires methods like Chemical Vapor Deposition (CVD) or other techniques, which allow for larger and more ordered crystal structures.

Methods to Achieve Crystalline ReS₂:

1. CVD Techniques: Utilizes gaseous precursors to create a solid material, enabling the growth of large and high-quality crystalline ReS₂ layers.
2. Temperature Control: Carefully managing the substrate temperature during deposition can promote crystalline growth. High temperatures often lead to better order in crystalline structures.
3. Encapsulation Techniques: Following the growth of the thin film, additional steps such as annealing may be used to encourage crystallization in the film.

Conclusion

In summary, the ALD process for ReS₂ predominantly results in thin films characterized by their uniform thickness and high quality, suited for various electronic applications. However, if the goal is to obtain crystalline structures, alternate methods like CVD or controlled temperature annealing processes are recommended for successful crystal growth. Employing a combination of techniques can maximize the functionality and quality of ReS₂ materials, depending on specific application needs.

For detailed information on the ALD process and its applications, you can explore resources like Springer and Wiley.